International Journal of Physics

International Journal of Physics | Vol. 1, No. 12, December 2010 | pp. 95–102

DOI: 10.46882/2010/IJP/000012

Article Type: Original Research Paper

Title: Experimental Evaluation of Plasma Parameter Profiles in a Low-Pressure Inductively Coupled Argon Discharge

Names of Authors: M. I. Garba¹, A. L. Nielsen²

Authors’ Affiliations: ¹Department of Physics, Bayero University, Kano, Nigeria; ²Department of Physics and Astronomy, Aarhus University, Aarhus, Denmark

Abstract: Inductively coupled plasma (ICP) sources are widely utilized in semiconductor manufacturing for precision etching and thin-film deposition due to their ability to generate high ion densities at low operating pressures. This study presents an experimental investigation of the spatial profiles of electron density, electron temperature, and plasma potential in a cylindrical ICP reactor operating with pure argon gas. The measurements were conducted using a computer-controlled, RF-compensated Langmuir probe across a radiofrequency (RF) power range of 100 W to 500 W at gas pressures between 1.33 Pa and 6.67 Pa. The experimental results show a distinct transition from the low-density capacitive mode (E-mode) to the high-density inductive mode (H-mode) when the RF power exceeds a threshold of 180 W at 2.67 Pa. In the H-mode, the peak electron density reaches 4.2 x 10¹¹ cm⁻³ near the reactor center, while the electron temperature remains stable between 2.8 eV and 3.5 eV. Spatial profiles reveal that the electron energy distribution function (EEDF) deviates significantly from a Maxwellian distribution at lower pressures, exhibiting a bi-Maxwellian structure due to nonlocal electron kinetics. These spatial metrics provide essential baseline data for validating two-dimensional fluid models of industrial plasma processing chambers.

Keywords: Inductively coupled plasma; Argon discharge; Langmuir probe; Electron density; Electron temperature; E-H mode transition; Electron energy distribution function; Semiconductor processing.

Manuscript Timeline: Received: September 05, 2010; Revised: October 20, 2010; Accepted: November 12, 2010; Published: December 02, 2010.

Citation: Garba, M. I., & Nielsen, A. L. (2010). Experimental Evaluation of Plasma Parameter Profiles in a Low-Pressure Inductively Coupled Argon Discharge. International Journal of Physics, 1(12), 95–102.

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