Kinetic Simulation of Electron Drift Mechanics and Radical Yields in Trifluoromethane Discharges

International Journal of Physics | Vol. 15, No. 3, March 2024 | pp. 17–24

DOI: 10.46882/2024/IJP/000167

Research Article

Title: Kinetic Simulation of Electron Drift Mechanics and Radical Yields in Trifluoromethane Discharges

Names of Authors: A. M. El-Chemali¹, S. H. Zhang²

Authors’ Affiliations:
¹ Department of Physics, Faculty of Science, Lebanese University, Beirut, Lebanon
² Department of Physics, Tsinghua University, Beijing, China

Abstract: Trifluoromethane (CHF3) gas discharges are widely utilized across the microelectronics manufacturing industries for precision dielectric oxide etching, chamber surface passivation, and thin-film texturing. This study develops a self-consistent kinetic simulation model to analyze electron drift mechanics and compute radical generation rates in low-pressure CHF3 discharges. We solved the electron Boltzmann equation using a multi-term spherical harmonic expansion framework across an expansive reduced electric field range (E/N) spanning 10.0 Td to 600.0 Td. The model incorporates comprehensive cross-section sets detailing elastic collision momentum transfers, vibrational pumping thresholds, dissociative attachment, and electron-impact ionization tracks. Our calculations demonstrate that adding helium diluents (from 20.0% to 70.0% by volume) significantly distorts the high-energy tail of the electron energy distribution function. At a field strength of E/N = 60.0 Td, the total CF2 radical production rate coefficient scales up by an order of magnitude due to enhanced electron mean energies. The calculated electron drift velocities match independent swarm experimental tracks within a tight ±4.5% variance index, providing vital baseline constants for optimization.

Keywords: Trifluoromethane; Boltzmann equation; electron transport; plasma kinetics; cross-section; dielectric etching

Manuscript Timeline: Received: December 14, 2023; Revised: January 20, 2024; Accepted: February 08, 2024; Published: March 13, 2024

Citation: El-Chemali, A. M., & Zhang, S. H. (2024). Kinetic Simulation of Electron Drift Mechanics and Radical Yields in Trifluoromethane Discharges. International Journal of Physics, 15(3), 17–24.

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